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020 _a9783540290032
_9978-3-540-29003-2
024 7 _a10.1007/978-3-540-29003-2
_2doi
050 4 _aQC170-197
072 7 _aPHFP
_2bicssc
072 7 _aSCI074000
_2bisacsh
072 7 _aPHFP
_2thema
082 0 4 _a539
_223
100 1 _aTsytovich, Vadim N.
_eauthor.
_4aut
_4http://id.loc.gov/vocabulary/relators/aut
245 1 0 _aElementary Physics of Complex Plasmas
_h[electronic resource] /
_cby Vadim N. Tsytovich, Gregory E. Morfill, Sergey V. Vladimirov, Hubertus M. Thomas.
264 1 _aBerlin, Heidelberg :
_bSpringer Berlin Heidelberg,
_c2008.
300 _aXIV, 370 p. 129 illus., 2 illus. in color.
_bonline resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
347 _atext file
_bPDF
_2rda
490 1 _aLecture Notes in Physics,
_x0075-8450 ;
_v731
505 0 _a1 Complex Plasma — Why It Is an Unusual State of Matter? -- 1.1 General Physical Differences Between Complex Plasma and Ordinary Matter -- 1.2 General Terminology in Complex Plasma and Ordinary Matter -- 1.3 History: Complex Plasmas in Space Physics -- 1.4 Problems of Strong Coupling in Plasmas -- 1.5 Openness of Complex Plasma Systems and Long-range Collective Interactions -- 1.6 Plasma Condensation -- 1.7 Special Aspects of Complex Plasma Investigations -- 1.8 Structures and Self-organization in Complex Plasmas -- 1.9 Outlook of the Subsequent Presentation -- References -- 2 Why Complex Plasmas Have Many Applications in Future Technology? -- 2.1 Main Discoveries in Applications of Complex Plasmas -- 2.2 Computer Technology -- 2.3 First Steps to Using Complex Plasma Properties in Computer Industry -- 2.4 New Surfaces, New Materials -- 2.5 New Energy Production -- 2.6 Environmental Problems -- References -- 3 Elementary Processes in Complex Plasmas -- 3.1 Screening of Grain Field in a Plasma -- 3.2 Charging of Grains in Partially Ionized Plasma -- 3.3 Forces Acting on Ions -- 3.4 Forces Acting on Grains -- 3.5 Forces Acting on Electrons: Characteristic Electric Fields -- References -- 4 Collective Effects in Complex Plasmas -- 4.1 Collective Linear Modes -- 4.2 Universal Instability of a Complex Plasma -- 4.3 Collective Modes Excited by Fast Particles -- 4.4 Observations of Collective Modes -- 4.5 Problems to be Solved for Collective Modes -- 4.6 Fluctuations, Collective Pair Interactions, and Pair Correlation Functions -- References -- 5 Micro-particle Collective and Non-collective Pair Interactions -- 5.1 General Properties of Micro-particle Pair Interactions -- 5.2 Shadow Non-collective Attraction Forces -- 5.3 Collective Attraction for Linear Screening -- 5.4 Collective Interactions for Non-linear Screening -- 5.5 Measurements of Screened Potential in Grain-grain Collisions -- References -- 6 Experiments on Plasma Crystals and Long-range Correlations -- 6.1 Plasma Crystals -- 6.2 Melting and Phase Transitions -- 6.3 Paradigms for Plasma Crystal Formation -- 6.4 Inspiration from Experiments -- References -- 7 Mono-layer Plasma Crystals and Clusters -- 7.1 Mono-layer Plasma Crystals -- 7.2 2D Plasma Clusters -- References -- 8 Comments on Other Dust Structures: Concluding Remarks -- 8.1 Dust Helical Clusters -- 8.2 Disordered Grain Structures -- 8.3 Dust Wall Sheaths -- 8.4 Dust Structures between Walls -- 8.5 Dust Convection in Structures -- 8.6 Hybrid Dust Structures -- 8.7 Micro-gravity Experiments -- 8.8 Future Research: Outlook for Complex Plasmas -- 8.9 Conclusion -- References.
520 _aComplex plasmas are dusty plasmas in which the density and electric charges of the dust grains are sufficiently high to induce long-range grain-grain interactions, as well as strong absorption of charged-plasma components. Together with the sources replenishing the plasma such systems form a highly dissipative thermodynamically open system that exhibits many features of collective behaviour generally found in complex systems. Most notably among them are self-organized patterns such as plasma crystals, plasma clusters, dust stars and further spectacular new structures. Beyond their intrinsic scientific interest, the study of complex plasmas grows in importance in a great variety of fields, ranging from space-plasma sciences to applied fields such as plasma processing, thin-film deposition and even the production of computer chips by plasma etching, in which strongly interacting clouds of complex plasmas can cause major contamination of the final product. Intended as first introductory but comprehensive survey of this rapidly emerging field, the present book addresses postgraduate students as well as specialist and nonspecialist researchers with a general background in either plasma physics, space sciences or the physics of complex systems.
650 0 _aNuclear physics.
650 0 _aAstrophysics.
650 1 4 _aAtoms and Molecules in Strong Fields, Laser Matter Interaction.
_0http://scigraph.springernature.com/things/product-market-codes/P24025
650 2 4 _aNuclear Physics, Heavy Ions, Hadrons.
_0http://scigraph.springernature.com/things/product-market-codes/P23010
650 2 4 _aPlasma Physics.
_0http://scigraph.springernature.com/things/product-market-codes/P24040
650 2 4 _aSpace Sciences (including Extraterrestrial Physics, Space Exploration and Astronautics).
_0http://scigraph.springernature.com/things/product-market-codes/P22030
650 2 4 _aComplex Systems.
_0http://scigraph.springernature.com/things/product-market-codes/P33000
650 2 4 _aSoft and Granular Matter, Complex Fluids and Microfluidics.
_0http://scigraph.springernature.com/things/product-market-codes/P25021
700 1 _aMorfill, Gregory E.
_eauthor.
_4aut
_4http://id.loc.gov/vocabulary/relators/aut
700 1 _aVladimirov, Sergey V.
_eauthor.
_4aut
_4http://id.loc.gov/vocabulary/relators/aut
700 1 _aThomas, Hubertus M.
_eauthor.
_4aut
_4http://id.loc.gov/vocabulary/relators/aut
710 2 _aSpringerLink (Online service)
773 0 _tSpringer eBooks
776 0 8 _iPrinted edition:
_z9783540815815
776 0 8 _iPrinted edition:
_z9783642067037
776 0 8 _iPrinted edition:
_z9783540290001
830 0 _aLecture Notes in Physics,
_x0075-8450 ;
_v731
856 4 0 _uhttps://doi.org/10.1007/978-3-540-29003-2
912 _aZDB-2-PHA
912 _aZDB-2-LNP
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